Femtosecond pulsed laser deposition of chromium diboride-rich thin films
Chromium borides are promising candidates for several structural applications including protective coatings for materials exposed to corrosive and abrasive environments. In this paper the pulsed laser deposition of chromium diboride-rich thin films has been carried out in vacuum by using a frequency doubled Nd:glass laser with a pulse duration of 250 fs. The films have been deposited at dierent substrate temperatures and characterized by X-ray diraction, X-ray photoelectron spectroscopy, scanning electron microscopy and transmission electron microscopy.