Surface properties of nanostructured NiO undergoing electrochemical oxidation in 3-methoxy-propionitrile
Nanostructured nickel oxide (NiO) was deposited in the configuration of thin film (thickness, l = 2–6 m)
onto fluorine-doped tin oxide (FTO) substrates via plasma-assisted rapid discharge sintering (RDS). Electrochemical
cycling of RDS NiO in 3-methoxy-propionitrile (3-MPN) revealed two characteristic peaks
of NiO oxidation which were associated to the surface-confined redox processes Ni(II) ? Ni(III) and