Ricerc@Sapienza

Nanostructured NiO as hole selective contact for perovskite solar cells is deposited on ITO from the potentiostatic anodic electrodeposition of NiOOH. Along with the large surface extension due to the honeycomb-like morphology, the electrodeposition route imparts different electrochemical features in respect to the classic sol-gel!derived NiO, which are two interesting features for optoelectronic applications.

The fabrication of window layers more transparent than those based on amorphous silicon (a-Si:H) could be a key factor to enhance the efficiency of heterojunction (HJ) solar cells. In this work amorphous hydrogenated silicon oxide (a-SiOx:H) as a transparent passivating layer and substoichiometric tungsten oxide (WOx), with its wide band gap and high work function, are proposed to form efficient hole-selective contacts on silicon-based HJ solar cells. A comparison is made between WOx films grown by RF sputtering and by thermal evaporation.