Investigating the electrodeposition mechanism of anodically grown NiOOH films on transparent conductive oxides
Electrodeposition of NiOOH is an attracting route toward nanosized films of NiO, a p-type semiconductor used in many advanced applications. In this paper, the deposition mechanism is thoroughly investigated aiming at the clarification of the deposition dynamics and the chemical nature of the deposit. We focused on initial stages of the potentiostatic deposition on ITO, which yields a nanostructured film. In the potential range investigated the process is mass transport controlled and strongly overlaps with oxygen evolution reaction.