EMC NanoLab | Ricerc@Sapienza

Descrizione

Il Laboratorio EMC2-Nano del Dipartimento di Ingegneria Astronautica, Elettrica ed Energetica (DIAEE) dell'Università degli Studi di Roma "La Sapienza" si trova in Via delle Sette Sale 12B, Roma, Italia, vicino alla Chiesa di S. Pietro in Vincoli . Il Lab è stato istituito nel 2006 per promuovere la ricerca scientifica e supportare le attività di apprendimento EMC. La Prof.ssa Maria Sabrina Sarto è Direttore del Laboratorio dal 2006. Il Laboratorio, inizialmente fondato per elaborare nanomateriali e nanocompositi per lo sviluppo di dispositivi per applicazioni EMC, è ora dotato di strumenti per la caratterizzazione meccanica ed elettrica completa dei materiali e la caratterizzazione elettromeccanica di piezoresistivi sensori/dispositivi. Le apparecchiature disponibili consentono prove nella gamma di frequenza da DC a 67 GHz. Il laboratorio è inoltre dotato di microscopie per l'imaging ottico e la lavorazione dei materiali e dei dispositivi prodotti. Molte attività di ricerca, svolte nell'EMC Lab, sono legate a programmi di ricerca finanziati da istituzioni, istituti di ricerca o industrie nazionali e internazionali. Il Laboratorio sostiene inoltre esercitazioni per diverse classi di Compatibilità Elettromagnetica ed Elettrotecnica di diversi corsi di ingegneria (Ingegneria Elettrica, Ingegneria Aerospaziale, Ingegneria delle Nanotecnologie).

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The EMC2-Nano Laboratory of the Department of Astronautical, Electrical and Energy Engineering (DIAEE) of the University of Rome "La Sapienza" is located in Via delle Sette Sale 12B, Rome, Italy, close to the Church of S. Pietro in Vincoli. The Lab was established in 2006 to promote scientific research and support EMC learning activities. Prof. Maria Sabrina Sarto has been the laboratory Director since 2006. The Lab, initially founded to process nanomaterials and nanocomposite for the development of devices for EMC applications, is now provided with instruments for full mechanical and electrical characterization of materials and elctromechanical characterization of piezorestive sensors/devices. The available equipment allows tests in the frequency range from DC to 67 GHz. The lab is also equipped with microscopies for optical imaging and machining of the produced materials and devices. Many research activities, carried out in the EMC Lab are related to research programs financed by national and international institutions, research institutes or industries. Moreover, the Lab supports exercitations for several classes of Electromagnetic Compatibility and Electrotechnics of different engineering courses (Electrical Engineering, Aerospace Engineering, Nanotechnology Engineering).

Tipologia

Chimico, Nanotecnologico, Plastici stampaggio/taglio, Prove materiali, Strumentale

Attività

Didattica : 5%

Ricerca : 90%

Servizi : 5%

Responsabile

Nome	E-mail	Struttura
Maria Sabrina Sarto	mariasabrina.sarto@uniroma1.it	DIPARTIMENTO DI INGEGNERIA ASTRONAUTICA, ELETTRICA ED ENERGETICA

Dipartimento o centro ospitante

DIPARTIMENTO DI INGEGNERIA ASTRONAUTICA, ELETTRICA ED ENERGETICA

Personale docente e di ricerca

Nome	E-mail	Struttura
Hossein Cheraghi Bidsorkhi	hossein.cheraghibidsorkhi@uniroma1.it	DIPARTIMENTO DI INGEGNERIA ASTRONAUTICA, ELETTRICA ED ENERGETICA
Alessandro Giuseppe D'Aloia	alessandrogiuseppe.daloia@uniroma1.it	DIPARTIMENTO DI INGEGNERIA ASTRONAUTICA, ELETTRICA ED ENERGETICA
Giovanni De Bellis	giovanni.debellis@uniroma1.it	DIPARTIMENTO DI INGEGNERIA ASTRONAUTICA, ELETTRICA ED ENERGETICA
Marco Fortunato	marco.fortunato@uniroma1.it	DIPARTIMENTO DI INGEGNERIA ASTRONAUTICA, ELETTRICA ED ENERGETICA
Fabrizio Marra	fabrizio.marra@uniroma1.it	DIPARTIMENTO DI INGEGNERIA ASTRONAUTICA, ELETTRICA ED ENERGETICA
Alessio Tamburrano	alessio.tamburrano@uniroma1.it	DIPARTIMENTO DI INGEGNERIA ASTRONAUTICA, ELETTRICA ED ENERGETICA

Personale tecnico

Nome	E-mail	Struttura
Fabrizio Marra	fabrizio.marra@uniroma1.it	DIPARTIMENTO DI INGEGNERIA ASTRONAUTICA, ELETTRICA ED ENERGETICA

KET

Nanotechnologies

Strumenti e attrezzature

Nome	Descrizione	Servizi Offerti	Tipologia
Dual platen grinder/polisher	Model: Buehler Metaserv Platen diameter: 254 mm - Platen speed: 50 to 500 rpm - Water Supply Pressure: 1-2 bar - Water Supply Flow:2 liters/min	Grinding and polishing of mildly hard to extremely hard samples	Attrezzature principali per la ricerca (piccole/medie/grandi attrezzature)
Dual Range Analytical balance	Model: Mettler Toledo MS205DU Main Characteristics: - Lower range capacity: 82g - Higher range capacity: 220g - Fine range readability: 0.01 mg - Gross range readability: 0.1 mg - Repeatability: 0.08 mg - Internal calibration weight	Fast settling time and consistent results for routine to complicated weighing procedures	Attrezzature principali per la ricerca (piccole/medie/grandi attrezzature)
Magnetic stirring hot-plate	Model: IKA C-Mag HS4 Main Characteristics: - Speed range: 100 - 1500 rpm - Maximum stirring volume: 5 L - Heating temperature range: 50 - 500 °C - Heating rate heating plate: 2.5 K/min	Stirring of large quantities of liquid mixtures (up to 5 L) Heating with/without simultaneous stirring up to 500 °C	Attrezzature principali per la ricerca (piccole/medie/grandi attrezzature)
High shear mixer	Model 1: IKA T 18 digital Ultra Turrax Main Characteristics: - Volume range min. (H2O): 0.001 L - Volume range max. (H2O): 1.5 L - Viscosity max.: 5000 mPas - Speed range: 3000 - 25000 rpm	Dispersion of a wide range of colloidal systems Homogenization, emulsification or suspension	Attrezzature principali per la ricerca (piccole/medie/grandi attrezzature)
Mechanical overhead stirrer with torque control	Model: Heidolph RZR 2102 Control Main Characteristics: - Lower speed range: 12-400 rpm - Higher speed range: 60-2000 rpm - Maximum torque (overload mode): 200 (400) Ncm - Maximum viscosity: 100000 mPas - Maximum stirring capacity: 100 L - Constant speed	Stirring of low to high viscosity liquids at constant speed	Attrezzature principali per la ricerca (piccole/medie/grandi attrezzature)
Vacuum-pressure diaphragm pump	Model: Millipore WP6122050 Main Characteristics: - Flow Rate: 37L/min - Max. Vacuum: 813mbar - Max. Pressure: 2.45 bar - Chemical resistant head and diaphragm for use with corrosive chemicals, solvents and vapors	- Vacuum filtration - Compressed air supply for applications requiring a max pressure of 2.45 bar	Attrezzature principali per la ricerca (piccole/medie/grandi attrezzature)
Forced air circulation laboratory oven	Model: Memmert UFE400 Main Characteristics: - Volume capacity: 53 L - Temperature range: from RT+5°C to 250°C - Setting accuracy: 0.1°C up to 100°C, 0.5°C beyond 100 -C - RS232C communication interface - Temperature uniformity: ≤ 2.2°C	- Curing of thermosets - Controlled temperature ramps for demanding applications - Applications where temperature uniformity is crucial	Attrezzature principali per la ricerca (piccole/medie/grandi attrezzature)
Ductless fume hood with two filtration columns	Model: Erlab Captair Flex XL482 Main Characteristics: - Filtrating columns: 2 (3 filters/columns) - Air volume treated: 460 m3/h - Dimensions: 1240x790x890 mm - Air velocity at the apertures: 0.4-0.6 m/s	- Handling of solids and liquids in a controlled environment	Attrezzature principali per la ricerca (piccole/medie/grandi attrezzature)
Binocular Stereo Microscope	Model: Motic SMZ-168 BLED Main Characteristics: - Widefield eyepieces WF10X/23mm - 6.7:1 Zoom ratio, WD=113mm - Magnification range: 0.75X-5X - Maximum magnification: 50X (100X) with 10X eyepieces (20X eyepieces) - External camera connector	- Microscopic imaging of large samples	Attrezzature principali per la ricerca (piccole/medie/grandi attrezzature)
Optical microscope	Model: Nikon Eclipse LV150 Main Characteristics: - Max. sample size: 150 x 150 mm - Maximum sample height: 47 mm - Bright field objective lens: 10X, 50X, 100X - Trinocular eyepiece tube - 3x2 stage (Stroke: 75 x 50 mm with glass plate) - NCB11 filter	- High resolution optical imaging of a wide variety of structures: Composite, MEMs, LCDs, metallurgy, wafers	Attrezzature principali per la ricerca (piccole/medie/grandi attrezzature)
Optical microscope 5Mpx digital camera	Model: Zeiss Axiocam ERc-5s Main Characteristics: - Pixel size 2.2 μm x 2.2 μm - Sensor size 5.7 mm x 4.28 mm equivalent - Live image Max. 13 fps at 800 x 600 pixels - Spectral sensitivity Approx. 400 nm-700 nm, IR filter	- Microscopic documentation, observation, and stand-alone use	Attrezzature principali per la ricerca (piccole/medie/grandi attrezzature)
Digital ThermohygroMeter	Model: Delta Ohm HD 2301,0 Main Characteristics: - Max Temperature range: -200÷650°C - Resolution: 0.1°C - Precision: ±0.1°C - Contact probe temp range: -50÷400°C - Immersion probe temp range: -50÷400°C	- Temperature measurement of solid samples - Temperature measurement of liquid samples	Attrezzature principali per la ricerca (piccole/medie/grandi attrezzature)
Ultrasonic tip horn processor (sonotrode)	Model: Sonics&Materials Vibracell VC505 Main Characteristics: - Frequency: 20 kHz (±50Hz) - Net power output: 500 W - Probe diameter: 13 mm - Processable vol. range (13mm tip): 50-250ml - Max. amplitude (13mm tip): 114 µm	- Dispersion of nanostructures - Cell lysing - Disaggregation And Deagglomeration - Emulsification	Attrezzature principali per la ricerca (piccole/medie/grandi attrezzature)
Dual column mechanical testing machine	Model: Instron 3366 Main Characteristics: - Max load capacity: 10kN - Speed range: 0.005-500 mm/min - Total Crosshead Travel: 1122 mm - Load Measurement Accuracy: ±0.5% of reading down o 1/100 of load cell capacity.	- Three points flexural test - Four points flexural test - Tensile tests - Compression tests - Adhesion tests	Attrezzature principali per la ricerca (piccole/medie/grandi attrezzature)
10 N Static load cell	Model: Instron 2530-428 Main Characteristics: - Load capacity: 10 N	- Suitable for different test types, including tension, compression, cyclic, and reverse stress	Attrezzature principali per la ricerca (piccole/medie/grandi attrezzature)
500 N Static load Cell	Model: Instron 2530-416 Main Characteristics: - Load capacity: 500 N	- Mechanical tests of small samples; - Mechanical tests of soft materials	Attrezzature principali per la ricerca (piccole/medie/grandi attrezzature)
Static Clip-on extensometer	Model: Instron 2630-107 Main Characteristics: - Operating temperature range: -100 °C to +200 °C - Gauge length: 25 mm - Specimen Thickness: 0 - 12.5 mm - Specimen Width: 0 - 40 mm - % Travel (Axial): +100/-10 %	- Rigid plastics testing - Composites testing	Attrezzature principali per la ricerca (piccole/medie/grandi attrezzature)
Three/four-point bending test fixture	Model: Instron 2810-400/(2810-405 4-point conversion kit) Main Characteristics: - 5 kN Load Capacity - Temperature Range: -100 °C to +350 °C - Support Span: 10 - 194 mm - Specimen Width: 0 - 50 mm	- Determination of flexural modulus ,flexural strength and flexural yield strength of plastics and composites	Attrezzature principali per la ricerca (piccole/medie/grandi attrezzature)
Wedge action grips	Model: Instron 2716-015 Main Characteristics: - Rated capacity: 30 kN - Maximum torque: - Temperature range: -70 °C- 250 °C	- Suitable for tensile test of wires, plastics, metals and elastomers with flat or round specimen shapes	Attrezzature principali per la ricerca (piccole/medie/grandi attrezzature)
Screw Side Action Grips	Model: Instron 2710-113 Main Characteristics: - Rated capacity: 1 kN - Maximum torque: 8 Nm - Temperature range: -70 °C÷125 °C	- Static tensile testing	Attrezzature principali per la ricerca (piccole/medie/grandi attrezzature)
Microprobe station	Model: Cascade Microtech Summit 11000B-M Main Characteristics: - Frequency range: DC ÷ 65 GHz - X-Y stage Travel: 203 mm x 203 mm - MicroChamber for dark, dry and enhanced EMI-shielding enclosure	DC and RF characterization of wafer-level devices up to 200mm, including RF/Microwave, device characterization, wafer-level reliability, e-test, modeling or yield enhancement	Attrezzature principali per la ricerca (piccole/medie/grandi attrezzature)
High frequency Coaxial GSG Probes	Model: Cascade Microtech Infinity Probes-167-A-GSG-150 Main Characteristics: - Pitch: 150 µm - Frequency range: DC to 50 GHz	- RF measurement up to 50 GHZ for planar device characterization and modeling	Attrezzature principali per la ricerca (piccole/medie/grandi attrezzature)
Ultrasonic bath	Model : Fisher FB 15061 Main Characteristics: - Max. tank volume: 9.5 lt; - Ultrasonic frequency: 37 kHz;	- Cleaning, mixing, and dispersion of liquid and solids	Attrezzature principali per la ricerca (piccole/medie/grandi attrezzature)
Four-point collinear probing station	Model: Signatone S-301-4 Main Characteristics: - Tips spacing: 1mm - Max operating temperature: 400 °C	- Resistivity measurement over planar geometries	Attrezzature principali per la ricerca (piccole/medie/grandi attrezzature)
Source measure unit	Model: Keithley 2400 SourceMeter Main Characteristics: - Voltage source range: ±200 mV ÷ ±200 V - Current source range: ±1 μA ÷ ±1 A - Resistance measuring range: 0.2 Ω÷200 MΩ - Software Compatibility: LabVIEW	- Precision voltage and current sourcing (DC) and measurement capabilities	Attrezzature principali per la ricerca (piccole/medie/grandi attrezzature)
Nano Voltmeter	Model: Keithley 2182A Main Characteristics: - Voltage range: 1nV÷100V - Temperature meas. Range: -200÷1820 °C - Resistance meas range: 10nΩ to 200MΩ	- Low noise voltage measurements and characterization of low resistance materials and devices	Attrezzature principali per la ricerca (piccole/medie/grandi attrezzature)
Electrometer/High resistance meter	Model : Keithley 6517B Main Characteristics: - Current range: 100aA÷20mA - Voltage range: 10µV ÷200V - Resistance range: 100Ω ÷ 10PΩ - Charge range: 10fC ÷ 2μC - Source range: 0 ÷ ±1000V	- Ultra-sensitive ammeter - Highest impedance voltmeter with voltage measurement from 1 µV to 200 V - Ultra-high range ohmmeter with resistance measurement up to 1018 Ω - Sensitive coulombmeter	Attrezzature principali per la ricerca (piccole/medie/grandi attrezzature)
DC and AC Current source	Model: Keithley 6221 Main Characteristics: - Current range: ± (100fA ÷100mA) - Resistance range: 10nΩ to 200MΩ (requires 2182A) - Internal Waveform Generator: 1mHz-100kHz with 10M samples/s output update rate - Sweep points: 65,536 (64k)	- Applications requiring low current sourcing noise, such as Hall measurements, resistance measurements using delta mode, pulsed measurements, and differential conductance measurements.	Attrezzature principali per la ricerca (piccole/medie/grandi attrezzature)
Kit Serigrafia			Attrezzature principali per la ricerca (piccole/medie/grandi attrezzature)
Stampanti 3D			Attrezzature principali per la ricerca (piccole/medie/grandi attrezzature)
LaserCutter			Attrezzature principali per la ricerca (piccole/medie/grandi attrezzature)

Ubicazione

Nome Stanza	Edificio	Piano
L005	RM032	PTE
L033	RM033	PTE

Altre Informazioni

Caratterizzazione elettrica ed elettromagnetica dei materiali: - Misurazioni con sonda a quattro punti - Caratterizzazione DC e RF di dispositivi a livello di wafer fino a 200 mm - Valutazione della resistività dell'insulto a materiali altamente conduttivi Lavorazione e lavorazione dei materiali - Dispersione/disagglomerazione ad ultrasuoni - Elaborazione di nanocompositi a base di termoindurenti e termoplastici - Rettifica, lucidatura, foratura, taglio di precisione di diverse classi di materiali Prove meccaniche ed elettromeccaniche - Piegatura a tre/quattro punti - Prove di trazione/compressione - Caratterizzazione elettromeccanica di materiali piezoresistivi Microscopia ottica Misure EC/TDS di soluzioni e sospensioni. ___________________________________________________________________________________________________________________________________________________________________________ Electrical and EM characterization of materials: - Four-point probe measurements - DC and RF characterization of wafer-level devices up to 200mm - Evaluation of the resistivity of insulting to highly conducting materials Materials processing and machining - Ultrasonic dispersion/disagglomeration - Processing of both themosets- and thermoplastics-based nanocomposites - Grinding, polishing, drilling, precision cutting of different classes of materials Mechanical and electromechanical tests - Three/Four-point bending - Tensile/compressive tests - Electromechanical characterization of piezoresistive materials Optical microscopy EC/TDS measurements of solutions and suspensions

Pagina web

https://web.uniroma1.it/diaee/laboratorio-EMC-ii-nano/laboratorio-EMC-ii-nano

Responsabile tecnico